Quorum: Q150T Turbo-Pumped Sputter Coater/Carbon Coater

Description

Please contact Newcastle University's Electron Microscopy Research Services to arrange bookings or training on this equipment.

www.ncl.ac.uk/emrs

em.researchservices@ncl.ac.uk

Key Features

• Metal sputtering or carbon evaporation, or both - can be combined in one space-saving design


• Fine grain sputtering for advanced high resolution FE-SEM applications


• High vacuum turbo pumping - allows sputtering of a wide range of oxidising and non-oxidising metals - suitable for SEM, high resolution FE-SEM and also for many thin film applications. NB: To avoid a short target life, it is not advisable to use targets of less than 0.3mm for coatings of 50nm or thicker in conjunction with high sputter currents. Please consider using a bonded or thicker target


• High vacuum carbon coating - ideal for SEM and TEM carbon coating applications


• Advanced 'anti-stick' carbon rod evaporation gun - simple operation, reproducible results


• Pulsed or ramped carbon coating modes - ramped evaporation can be selected for enhanced control and reproducibility of deposited carbon


• Glow discharge option - for modification of specimen surface properties (eg hydrophobic to hydrophilic conversion)


• Enhanced sputtering of aluminium using optimised pulse cleaning


• Precise thickness control using the film thickness monitor option


• Fully automatic touch screen control - rapid data input, simple operation


• Multiple, customer-defined coating schedules can be stored - ideal for multi-user laboratories


• Automatic vacuum control which can be pre-programmed to suit the process and material - no needle valve to adjust


• 'Intelligent' recognition of system - automatically detects the type of coating insert fitted


• Easy-to-change, drop-in style specimen stages (rotation stage as standard)


• Vacuum shut-down feature - leaves the process chamber under vacuum when not in use - improved vacuum performance


• Pump hold - allows the system to be held in continuous pumping mode, awaiting user input before continuing the process


• Thick film capabilities - up to 60 minutes sputtering time without breaking vacuum (rest periods automatically built in)


• Ergonomic one-piece moulded case - easy maintenance and service access


• Ethernet with local FTP server connection - simple programmer updates


• Power factor correction - complies with the current legislation (CE Certification) - efficient use of power means reduced running costs