This is a photolithography system that allows a pattern to be written in optically sensitive resist by scanning a laser spot over the surface. This allows larger area contacts and large scale devices to be produced at lower cost than taking valuable time on the electron beam facility. Facility: http://www.graphene.manchester.ac.uk/
Professor Sir Konstantin Novoselov | |
Konstantin.Novoselov@manchester.ac.uk | |
+44-161-275-4119 |
Professor Sir Konstantin Novoselov | |
Konstantin.Novoselov@manchester.ac.uk | |
+44-161-275-4119 |